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Radio-Frequency Vacuum Cleaning System

Radio-Frequency Vacuum Cleaning System
Radio-Frequency Vacuum Cleaning System
Radio-Frequency Vacuum Cleaning System
Radio-Frequency Vacuum Cleaning System

Radio-Frequency Vacuum Cleaning System

This equipment adopts plasma cleaning technology, which uses high-energy plasma to bombard the surface of the device to be cleaned, and causes the contaminants to fall off from the inner surface of the pores through physical action to achieve the cleaning effect. It has the characteristics of high vacuum degree, high cleaning efficiency, convenient operation, stability and reliability, etc. It is mainly used for precision Clean the complex closed channels inside the device.
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Parameter

Specification

UItimate vacuum

1×10-Pa

RF frequency

13.56 MHz

RF powei

0-500   W

Process gases

Oxygen,Neon,Argon

Process gas pressure range

100-10000 Pa
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