Item NO :
WS/WSU251; WS/WSU501; WS/WSU1001;WS/WSU2001Vacuum Pump Roots Pump WA/WAU251 Mechanical Booster Pump Maintenance
Roots pumps – reliable, safe and durable
1. Proven and mature technology
RUVAC series roots pumps, which have been around for decades, have proven their ability to perform in a wide range of vacuum applications.
When used in tandem with an oil or dry backing pump, the rotary booster can significantly increase the pumping speed of the system and increase the vacuum that the system can generate, thereby extending the operating range of the backing pump. Roots pump has 3 series: WA series with air-cooled flange motor; WS series with tank air-cooled motor; The WH series adopts a fully sealed water-cooled motor. Each series contains different pumping speeds for different applications. All three series of roots pumps are available in versions with or without bypass valves, also known as pressure balancing valves.
01, RUVAC rotary lobe can be used for horizontal or vertical flow installation, which can improve the flexibility of the system, and the installation position can be changed during installation.
02, the bearing of RUVAC Roots pump and its durability, connected to it is the efficient lubrication system of Roots Pump, which ensures the silence and stability of Roots Booster during operation.
03, WS and WSU series roots pump motor, the rotor is sealed by the tank in a vacuum separated from the stator.
Since no drive shaft is connected from the outside to the inside, the rotor can be optimally sealed in a vacuum.
Thanks to an efficient lubrication system, the WS series roots pumps can run at speeds of up to 6000 RPM
This means that the WA(U) series can achieve higher pumping speeds for the same size vacuum pump while meeting the IE3 energy efficiency requirements
Technlcal Data |
|
WS/WSU 251 |
WS/WSU(H)601 |
||
60 Hz |
60 Hz |
60 Hz |
60 Hz |
||
Nomlnal pumplng speed |
m²/h(ctm) |
253(149) |
304 (179) |
505 (297.4) |
606 (357) |
Max olfoctivo pumplng spood |
m/h (cfm) |
210.0(123.7) |
251.0(148.0) |
410.(241) |
530(312) |
with bookdng pump |
TRIVAC |
D65B |
D 65B |
SV200 |
SV200 |
UUmale total pressure |
mbar (Tom) |
<Bx10¹(<6x105 |
<8x10⁴(<6x109 |
<4x10²(<3x109 |
<4x10²(<3x10) |
Mox pemlsslble prossure difforence during conunuous operalon mbar(Tom) |
80.0(60.0 |
||||
Lenk rale,Inlegral |
mbar xVe |
<1x104 |
|||
Malng aupply |
V |
200/230/400 |
200-208/265/460 |
200/230/400 |
200-208/265/460 |
Themal cass |
F |
||||
Pemlsslble amblent lemperatures |
CCF |
n+5 to +40(+41 to+104) |
|||
Molor power |
kW ho) |
1.1(1.5) |
1.4(1.9) |
2.2(3.0) |
2.4(3.3) |
Nomlnal soeod.8porox |
pm |
3000 |
3000 |
3000 |
3500 |
Mnx.pormlasIblo spoed |
pm |
6000 |
|||
Typeof prolecUon |
IP |
20 |
|||
Lubnoant for tho boartng chambor |
|
||||
vortionl pumplng aclon,approx |
I(qt) |
0.55 (0.58) |
0.55 |0.58) |
0.76 (0.79) |
0.76 (0.79) |
other ols |
|
0.6 (0.63) |
0.6 (0.63) |
0.8 [0.85] |
0.8 [0.85] |
horlzontnl pumplng octlon,opprox |
I(qt) |
0.45 (0.48) |
0.45 (0.48) |
0.7 (0.74) |
0.7 (0.74) |
Connectlon langes |
DN |
63 SO-K |
|||
Welght WS /WSU |
kg |
90/95 |
80/85 |
130/135 |
130/135 |
Nolse level |
dB(A) |
<58 |
<60 |
<52 |
<56 |
chnical Data |
WS/WSU(H)1001 |
WS/WSU(H)2001 |
|||
|
50 Hz |
60 Hz |
50 Hz |
60 Hz |
|
Nominal pumping speed |
m³/h (cfm) |
1000 (589) |
1200(707) |
2050(1207.5) |
2460(1449) |
Max.effective pumping speed |
m³/h (cfm) |
800 (470) |
1000 (588) |
1850(1089) |
2100(1236) |
with backing pump |
SOGEVAC |
SV 300 B |
SV 300 B |
SV 630 BF |
SV 630 BF |
Ultimate total pressure |
mbar(Tor) |
<4×10²(<3x103) |
|||
Max.permissible pressure difference |
mbar(Tor) |
80.0 (60.0) |
80.0 (60.0) |
50.0(37.5) |
50.0(37.5) |
Leak rate,integral |
mbar x l/s |
|
<1x10⁴ |
||
Mains supply |
V |
200/230/400 |
200-208/265/460 |
200/230/400 |
200-208/265/460 |
Thermal class F |
|||||
Permissible ambient temperatures |
℃(F) |
+5 to+40(+41 to +104) |
|||
Motor powe |
kW (hp) |
4.0 (5.4) |
4.4 (6.0) |
7.5(10.0) |
8.5(11.6) |
Nominal speed.approx. |
rpm |
3000 |
3600 |
3000 |
3600 |
Max.permissible speed |
rpm |
6000 |
6000 |
42004 |
42004 |
Type of protection |
IP |
20 |
|||
Lubricant for the bearing chamber |
|||||
LVO 400 |
|||||
vertical pumping action,approx |
1(qt) |
1.75(1.85) |
1.75(1.85) |
2.7 (2.85 |
2.7 (2.85 |
other oils |
|||||
vertical pumping action,approx |
1(qt) |
1.8(1.90) |
1.8(1.90) |
3.6 (3.81) |
3.6 (3.81) |
horizontal pumping action,approx |
1(qt) |
1.1(1.16) |
1.1(1.16) |
2.4 (2.54) |
2.4 (2.54) |
Connection flanges |
DN |
100 ISO-K |
100 ISO-K |
160 ISO-K |
160 ISO-K |
Weight WS /WSU |
kg |
228/233 |
228/233 |
458/465 |
458/465 |
|
(lbs) |
(502.7/513.8) |
(502.7/513.8) |
(1009.9/1025.3) |
(1009.9/1025.3) |
Noise level |
dB(A) |
<60 |
<60 |
<65 |
<67 |
2, intelligent series
The alcohol-tested RUVAC series of roots pumps is used in almost all vacuum applications, and we can supply standard roots pump systems with the TRIVAC series or SOGEVAC series, as well as standard dry systems for use with dry backing pumps such as DRYVAC and SCREWLINE.
uses roots technology for vacuum applications, and today RUVAC rotary lobe pumps meet all the process requirements in demanding vacuum applications.
01, RUVAC roots pumps are often used as "booster pumps" to help smaller backing pumps to evacuate larger chambers or to pump a better vacuum in the chamber.
02. Typical applications are heat treatment, industrial furnace, metallurgy and large-format coating.
03, RUVAC roots pump has become the standard in the architectural glass coating industry. Combined with SOGEVAC to form an oil-type system for evacuation of the injection chamber; It is also possible to form a purely dry system with DRYVAC or SCREWLINE for applications in the process room.
04, RUVAC rotary lobe pumps are often used to minimize evacuation time, such as in the injection chamber for coating applications or for fast-cycle food packaging applications
05, Roots pumps are used in lighting applications, which can pump the pressure below 10-3mbar in a very short time
06, RUVAC roots pumps are also commonly used in monocrystalline silicon pulling processes in solar cell or semiconductor applications. We will be happy to support you with product and application technology.
Tags :